IEC 62047-2:2006

Title

Language: EN Semiconductor devices - Micro-electromechanical devices - Part 2: Tensile testing method of thin film materials

Language: FR Dispositifs à semiconducteurs - Dispositifs microélectromécaniques - Partie 2: Méthode d'essai de traction des matériaux en couche mince

Abstract

Language: EN Specifies the method for tensile testing of thin film materials with length and width under 1 mm and thickness under 10 m, which are main structural materials for micro-electromechanical systems (MEMS), micromachines and similar devices. The main structural materials for MEMS, micromachines and similar devices have special features such as typical dimensions in the order of a few microns, a material fabrication by deposition, and a test piece fabrication by non-mechanical machining using etching and photolithography. This International Standard specifies the testing method, which enables a guarantee of accuracy corresponding to the special features.

Language(s)
Language: EN Language: FR
Edition
1.0
Date of issue
15.08.2006
TC 47/SC 47F
ICS Codes
31.080.99
Publication number
62047
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Mandatory Standard according current regulation Mandatory Standard according current regulation

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